| Zugriffsnummer | 19558 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | X-ray spectrometry for wafer contamination analysis and speciation as well as for reference-free nanolayer characterization |
| Autor(in); Institution |
Beckhoff, Burkhard; 7.1, Photonenradiometrie, PTB-Berlin
Fliegauf, Rolf; 7.1, Photonenradiometrie, PTB-Berlin
Kolbe, Michael; 7.1, Photonenradiometrie, PTB-Berlin
Müller, Matthias; 7.1, Photonenradiometrie, PTB-Berlin
Pollakowski, Beatrix; 7.1, Photonenradiometrie, PTB-Berlin
Weser, Jan; 7.1, Photonenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
|
| Quelle/Jahr | Proceedings of the Eight International Symposium on Ultra-Clean Processing of Silicon Surfaces: [held in Antwerp, Belgium, September 17 - 21, 2006]. Solid State Phenomena: 134 (2008), 277 - 280 |
| ISSN | 1012-0394 |
| ISBN | 3-908451-46-9 |
| Verlag | Uetikon: Trans Tech Publications |
| Konferenzangaben | 8th International Symposium on Ultra Clean Processing of Semoconductor Surfaces, Antwerp, 17.-21.09. 2006, Belgium |
| Freie Schlagworte | XRF ; TXRF ; GIXRF ; NEXAFS ; contamination analysis ; speciation ; nanolayer characterization ; synchrotron radiation |
| Zusammenfassung | Monochromatized synchrotron radiation of the electron storage ring BESSY II in Berlin has been used for the non-destructive investigation of wafer surface contamination and nanolayered materials by X-ray spectrometry. For this purpose the fluorescence spectra of various samples have been recorded in different geometries: varying the incident angle from close to zero degrees, i.e. totalreflection geometry (T), over grazing incidence (GI) to conventional X-ray fluorescence (XRF). In TXRF geometry only the surface is analyzed, whereas GIXRF and XRF provide information from subsurface layers respectively the bulk of a sample. |
