| Zugriffsnummer | 18284 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Developments of a nanoscale linewidth-standard for high-resolution optical microscopy |
| Autor(in); Institution |
Huebner, Uwe; Institute for Physical High Technology, Jena, GERMANY
Morgenroth, W.; Institute for Physical High Technology, Jena, GERMANY
Boucher, R.; Institute for Physical High Technology, Jena, GERMANY
Mirandé, Werner; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Buhr, Egbert; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Fries, Th.; FRT GmbH, Bergisch-Gladbach, GERMANY
Schwarz, Nadine; FRT GmbH, Bergisch-Gladbach, GERMANY
Kunath-Fandrei, G.; Carl Zeiss GmbH, AIM, Jena, GERMANY
Hild, R.; HTWK Leipzig, Leipzig, GERMANY
|
| Quelle/Jahr | Optical fabrication, testing and metrology II:(2005), 59651W-1 - 59651W-9 |
| Schriftenreihe | Proceedings of SPIE: 5965 |
| Herausgeber(in) |
Duparré, Angela
|
| ISBN | 0-8194-5983-6 |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE Europe International Symposium "Optical Systems Design", Jena, 13-15, September, 2005, Germany |
| Freie Schlagworte | electron beam lithography ; ECR-plasma etching ; linewidth-standard ; ultraviolet microscopy ; confocal laser scanning microscopy |
| Zusammenfassung | We are developing a new linewidth standard on the nanometre scale for use in the recently introduced new high-resolution optical microscopy techniques like deep ultraviolet microscopy (UVM) and confocal laser scanning microscopy (CLSM). Different types of high-resolution gratings, etched in amorphous silicon on quartz substrates, have been fabricated and initially evaluated using state-of-the-art UVM, CLSM, REM and AFM equipment. The produced linewidths range from about 80 nm to 2 μm. The contrast of the pattern in the UV region make them suited for transmission and reflection UV and laser scanning microscopy. |
Zitierung
Huebner, U., Morgenroth, W., Boucher, R., Mirandé, W., Buhr, E., Fries, T., Schwarz, N., Kunath-Fandrei, G., & Hild, R. (2005). Developments of a nanoscale linewidth-standard for high-resolution optical microscopy. SPIE Europe International Symposium "Optical Systems Design", Jena, 13-15, September, 2005, Germany.