| Zugriffsnummer | 17895 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Determination of the short wavelength cutoff of interferential and confocal microscopes. |
| Autor(in); Institution |
Krüger-Sehm, Rolf; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
Frühauf, Joachim; TU Chemnitz, Faculty of Electroengineering and Information Technology, Ilmenau, GERMANY
Dziomba, Thorsten; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
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| Quelle/Jahr | Proceedings of the 10th International Conference on Metrology and properties of engineering surfaces ; July 4 - 7, 2005, Saint-Etienne, France:(2005), 21 - 28 |
| ISBN | 2-86272-389-4 |
| Verlag | Saint-Etienne: Univ. |
| Konferenzangaben | 10th International Conference on Metrology and properties of engineering surfaces, St. Etienne, 05-07, July, 2005, France |
| Freie Schlagworte | Interferenzmikroskopie ; Konfokale Mikroskopie ; Kalibrierung ; Auflösung |
| Zusammenfassung | For the characterisation of a surface the spatial short wavelength cutoff of the measuring instrument is an important parameter, that has to be known especially on condition, that different techniques are to be compared. The definition of the transfer characteristic by a transmission bandwidth with Ls and Ls-limits as in the GPS-standards for surface contact stylus measurement is transferred here to the optical instruments that are widely used for the same task as the mechanical instruments would do. For the aim to find out the short wavelength limit in the sense of ISO 3274, a set of gratings is used, that contains areas with different pitch values all having the same height. The range of pitch values spans from 4 μm to 800 μm with a 2-4-8-subdivision. In the first step the user has to measure the depth of a groove for which the wavelength is well within the transfer band. This is like the use of a depth measurement standard. In the second step that grating section has to be found out, for which the measured depth is half of the long wavelength depth. The specimen is available with a height of 90 nm and nearly 4 μm. The manufacturing process, considering the metrological design aspects, is described afterwards. After some example measurements with different instruments an outlook to other applications of this set of gratings is given. Especially the use of this specimen in the frame of ISO standardisation for optical instruments is indicated. |
