Zugriffsnummer 17839
Dokumenttyp Konferenzartikel
Sprache Englisch
Titel Traceable multiple sensor system for absolute form measurement
Autor(in); Institution
Schulz, Michael; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Gerhardt, Joachim; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Geckeler, Ralf D.; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Elster, Clemens; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Quelle/Jahr Advanced characterization techniques for optics, semiconductors, and nanotechnologies II:(2005), 58780A-1 - 58780A-8
Schriftenreihe Proceedings of SPIE: 5878
Herausgeber(in)
Duparré, Angela
ISBN 0-8194-5883-X
DOI
Verlag Bellingham, Wash.: SPIE
Konferenzangaben Conference on Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, San Diego, Calif., 02-04, August, 2005, USA
Zusammenfassung The requirements for form or topography measurement become ever-challenging. Desired lateral resolutions are sometimes smaller than one millimeter, whereas the size of the specimen can exceed one meter. To meet these requirements, scanning measurement systems are increasingly applied with sensors being (much) smaller than the specimen. However, due to the presence of quadratic sensor and scanning stage errors, large errors of the reconstructed topographies can emerge. To overcome these problems, a novel scanning measurement system is proposed. The system includes a linear scanning stage, a compact interferometer used for multiple distance measurements and an autocollimator for additional angular measurements. The effect of quadratic sensor and first-order scanning stage errors which the system allows to eliminate is discussed. Topography reconstruction is outlined and first measurements with a demonstrator set-up are described which show that the proposed novel measurement principle works well under real measurement conditions.

Zitierung

Schulz, M., Gerhardt, J., Geckeler, R. D., & Elster, C. (2005). Traceable multiple sensor system for absolute form measurement. Conference on Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, San Diego, Calif., 02-04, August, 2005, USA. https://doi.org/10.1117/12.614726

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