| Zugriffsnummer | 17547 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Status of EUV reflectometry at PTB |
| Autor(in); Institution |
Scholze, Frank; 7.1, Photonenradiometrie, PTB-Berlin
Laubis, Christian; 7.1, Photonenradiometrie, PTB-Berlin
Buchholz, Christian; 7.1, Photonenradiometrie, PTB-Berlin
Fischer, Andreas; 7.1, Photonenradiometrie, PTB-Berlin
Plöger, Sven; 7.1, Photonenradiometrie, PTB-Berlin
Scholz, Frank; 7.1, Photonenradiometrie, PTB-Berlin
Wagner, Heike; 7.1, Photonenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
|
| Quelle/Jahr | Emerging lithographic technologies IX:(2005), 749 - 758 |
| Schriftenreihe | Proceedings of SPIE: 5751,2 |
| ISSN | 0277-786X |
| ISBN | 0-8194-5731-0 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE 30th International Symposium Microlithography, San Jose, CA, 27 February - 4 March 2005, USA |
| Freie Schlagworte | Extreme ultraviolet ; metrology ; lithography ; at-wavelength characterization ; reflectometry ; synchrotron radiation |
| Zusammenfassung | The development of EUV lithography is critically based on the availability of suitable metrology equipment. To meet the industries requirements, the Physikalisch-Technische Bundesanstalt (PTB) operates an EUV reflectometry facility at the electron storage ring BESSY II. It is designed for at-wavelength metrology of full-size EUVL optics with a maximum weight of 50 kg and a diameter of up to 550 mm. A micro-reflectometry station was installed for reflectometry with sub 10 μm spatial resolution. To meet the increasing demands of metrology for future lithography production tools, the measurement uncertainty was permanently decreased. For peak reflectance, a total relative uncertainty of 0.14 % is achieved with a reproducibility of 0.07 %. The uncertainty of 0.014 % in the center wavelength is mainly given by the uncertainty for the reflectance of the Kr 3d5/2-5p resonance. The longterm reproducibility was 0.008 %. We have recently demonstrated a short-term repeatability below 10-5.This good repeatability is important for the determination of the coating thickness gradient at alpha-tool optics. We present a long-term series of measurements at a set of EUV mirrors and discuss our recent results in improving wavelength reproducibility. |
Zitierung
Scholze, F., Laubis, C., Buchholz, C., Fischer, A., Plöger, S., Scholz, F., Wagner, H., & Ulm, G. (2005). Status of EUV reflectometry at PTB. SPIE 30th International Symposium Microlithography, San Jose, CA, 27 February - 4 March 2005, USA. https://doi.org/10.1117/12.598728