| Zugriffsnummer | 16205 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Metrological characterization of nanometer film thickness standards for XRR and ellipsometry applications |
| Autor(in); Institution |
Hasche, Klaus; 5, Fertigungsmesstechnik, PTB-Braunschweig
Thomsen-Schmidt, Peter; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
Krumrey, Michael; 7.12, Röntgenradiometrie, PTB-Berlin
Ade, George; 2.4, Quantenelektronik, PTB-Braunschweig
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Stümpel, Jürgen; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
Schaedlich, Stefan; Fraunhofer-Institute for Material and Beam Technology (IWS), Dresden, GERMANY
Frank, Wilfried; Institute for Surface Modification (IOM), Leipzig, GERMANY
Procop, Mathias; Bundesanstalt für Materialforschung und -prüfung (BAM), Berlin, GERMANY
Beck, Uwe; Bundesanstalt für Materialforschung und -prüfung (BAM), Berlin, GERMANY
|
| Quelle/Jahr | Recent developments in traceable dimensional measurements II:(2003), 165 - 172 |
| Schriftenreihe | Proceedings of SPIE: 5190 |
| Herausgeber(in) |
Decker, Jennifer E.
|
| ISSN | 0277-786X |
| ISBN | 0-8194-5063-4 |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Recent Developments in Traceable Dimensional Measurements II, San Diego, California, 4-6, August, 2003, USA |
| Zusammenfassung | Two types of film thickness standards have been developed, manufactured and investigated - for X-ray reflectometry(XRR), X-ray fluorescence analysis (XRF), electron probe micro analysis (EPMA) on the one hand, and ellipsometry on the other. Metrological characterization of both specific kinds of material measures and investigation results achieved are reported. The standards for XRR, XRF and EPMA consist of fused silica substrate coated with Pt resp. a C-Ni-C-layer-system with a nominal metal layer thickness of 10 nm alternatively 50 nm. XRR proved to be dominant investigation method. Apart from film thickness characteristics like film variances, interdiffusion between substrate and film have been analyzed. The standards for calibration of ellipsometer used for film thickness determination consist of an Sisubstrate and an SiO2-film. Tey are provided with an additional topographic structure making a topographic film thickness determination (approximately) possible. Film thickness determinations were effected by XRR and Scanning Force Microscopy in combination with Transmission Electron Microscopy as well as various ellipsometrical techniques. The nominal values of film thickness are between 6 nm and 1000 nm. The consistency of results found by different measurement techniques is discussed. |
Zitierung
Hasche, K., Thomsen-Schmidt, P., Krumrey, M., Ade, G., Ulm, G., Stümpel, J., Schaedlich, S., Frank, W., Procop, M., & Beck, U. (2003). Metrological characterization of nanometer film thickness standards for XRR and ellipsometry applications. Recent Developments in Traceable Dimensional Measurements II, San Diego, California, 4-6, August, 2003, USA.