| Zugriffsnummer | 16112 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Fast and robust profiler for measuring topography up to 1 meter length and 1 nanometer uncertainty |
| Autor(in); Institution |
Illemann, Jens; 4.21, Bildoptik, PTB-Braunschweig; Möller-Wedel Optical GmbH, Wedel, GERMANY
Schulz, Michael; 4.21, Bildoptik, PTB-Braunschweig
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| Quelle/Jahr | Sensor 2003: Proceedings: 2 (2003), 127 - 132 [print ed.]; [CD-ROM] file name: SENSOR_Proceedings.pdf (S. 587-592) |
| Verlag | Wunstorf: AMA Service GmbH |
| Konferenzangaben | 11th International Conference for Sensor Technology, SENSOR 2003, Nürnberg, 13-15, Mai, 2003, Germany |
| Zusammenfassung | There is a need for high precision topography measurement of large specimens in different areas of science and industry: calibration of reference flats for interferometers, straightness standards for coordinate measuring machines, form measurement on free-form surfaces, especially for large telescopes, (EUV) lithography, synchrotron mirrors, etc. Up to now, uncertainties for material flatness or even free-form references specified better than 10 nm for dimensions larger than 250 mm have not been achievable or attained only in very specific cases. Such references and interferometers of adequate size - if available at all - would be most expensive and usable only for a small class of surfaces. The limit of uncertainty (only relative to a reference) is of the order of magnitude of 10 nm. We are developing an optical profiler using an electronic autocollimator (AC), which does not need specific mechanics - such as granite-stages and air-bearings - nor a reference surface. Due to the ESAD method applied (Extended Shear Angle Difference) there are no practical limitations to the scanning length. The uncertainty approaches the above-mentioned limits. |
