| Zugriffsnummer | 15053 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | A novel instrumentation for contamination and deposition control on 300 mm silicon wafers employing synchrotron radiation based TXRF and EDXRF analysis |
| Autor(in); Institution |
Beckhoff, Burkhard; 7.12, Röntgenradiometrie, PTB-Berlin
Fliegauf, Rolf; 7.12, Röntgenradiometrie, PTB-Berlin
Weser, Jan; 7.12, Röntgenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
|
| Quelle/Jahr | UCPSS 2002: procceedings Sixth International Symposium on Ultra Clean Processing of Silicon Surfaces;in: Solid State Phenomena: 92 (2003), 89 - 92 |
| Availability | [CD-ROM] ; file name: pag 089 Anovelinstrumentation.pdf |
| Konferenzangaben | Sixth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002), Oostende, 16-18,September, 2002 Belgien, Oostende, 16-18, September, 2002, Belgien |
| Freie Schlagworte | TXRF ; EDXRF ; 300 mm wafer ; contamination analysis ; deposition control ; synchrotron |
| Zusammenfassung | A novel instrumentation for analyzing contamination on 200 mm and 300 mm silicon wafer surfaces by synchrotron based total reflection X-ray fluorescence (TXRF) has been designed by the Physikalisch-Technische Bundesanstalt. This instrumentation is also suited for energy-dispersive X-ray fluorescence (EDXRF) analysis of thin structures deposited on silicon wafers. The most prominent features are a high vacuum load-lock combined with an equipment front end module (EFEM) and an UHV irradiation chamber with an electrostatic chuck (ESC) mounted on an 8-axis manipulator. The whole surface of a 200 mm or a 300 mm wafer can be scanned by monochromatized undulator radiation. The instrumentation will be commissioned in the autumn of 2002, and off-line TXRF and EDXRF routine analyses shall start a few month later. |
Zitierung
Beckhoff, B., Fliegauf, R., Weser, J., & Ulm, G. (2003). A novel instrumentation for contamination and deposition control on 300 mm silicon wafers employing synchrotron radiation based TXRF and EDXRF analysis. Sixth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2002), Oostende, 16-18,September, 2002 Belgien, Oostende, 16-18, September, 2002, Belgien.