Zugriffsnummer 15048
Dokumenttyp Konferenzartikel
Peer Review unbekannt
Sprache Englisch
Titel Applications of calibration comparison in on-wafer measurement
Autor(in); Institution
Arz, Uwe; 2.22, Hochfrequenzmesstechnik, PTB-Braunschweig
Williams, Dylan F.; National Institute of Standards and Technology (NIST), Boulder, USA
Quelle/Jahr XXVIIth General Assembly of the International Union of Radio Science = XXVIIe Assemblée Générale de L'Union Radio-Scientifique Internationale:(2002)
Availability [CD-ROM] ; file name: p0954.pdf
Verlag Maastricht: URSI
Konferenzangaben URSI XXVIIth General Assembly, Maastricht, 17-24, August, 2002, The Netherlands
Freie Schlagworte on-wafer measurements ; calibration comparison ; scattering parameters ; multiport calibration ; substrate permittivity compensation ; characteristic impedance measurement
Zusammenfassung In this paper we discuss several applications of calibration comparison in on-wafer measurement. This technique can be understood as an abstraction of the well-known two-tier deembedding scheme used in test-fixture characterisation. The applications presented here include the assessment of accuracy of a given on-wafer calibration with respect to a benchmark calibration, the compensation for substrate permittivity in probe-tip calibration, the determination of characteristic impedance in planar transmission line structures, and multiport calibration.

Zitierung

Arz, U. & Williams, D. F. (2002). Applications of calibration comparison in on-wafer measurement. URSI XXVIIth General Assembly, Maastricht, 17-24, August, 2002, The Netherlands.

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