| Zugriffsnummer | 14979 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Sprache | Englisch |
| Titel | Calibrated scanning force microscope with capabilities in the subnanometre range [poster] |
| Autor(in); Institution |
Hasche, Klaus; 5, Fertigungsmesstechnik, PTB-Braunschweig
Herrmann, Konrad; 5.12, Mikro- und Nanotopographie, PTB-Braunschweig
Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig
Seemann, Reiner; 8.201, Medizinische Messdatenerfassungssysteme, PTB-Berlin
Vitushkin, Leonard; Bureau International des Poids et Mesures (BIPM), Sèvres, FRANCE
Xu, Min; 5.12, Mikro- und Nanotopographie, PTB-Braunschweig; Tsinghua University, Beijing, CHINA
Yu, Guoqiang; 5.12, Mikro- und Nanotopographie, PTB-Braunschweig; Tianjin University, Tianjin, CHINA
|
| Quelle/Jahr | Surface and Interface Analysis: 33 (2002), 2, 71 - 74 |
| ISSN | 0142-2421 |
| DOI | |
| Verlag | Chichester: Wiley |
| Konferenzangaben | 4. International Conference on the Development and Technological Application of Scanning Probe Methods ; SXM4, Münster, September 25-27, 2000, Germany |
| Freie Schlagworte | scanning force microscopy ; traceability of measurement results ; calibration ; subnanometre uncertainty |
| Zusammenfassung | This paper refers to quantitative Scanning Force Microscopy and dimensional measurement being traceable to metrological standards. The traceability to the unit of length is achieved by calibration of several thousands of selected and sufficiently defined reference positions within the three-dimensional measuring ranges by three miniature laser interferometers and their output signals at distances of λ/2 (λ corresponds with the wavelength of the He/Ne-laser radiation). The expanded uncertainty U of the laser interferometer output signals is estimated to be ≤ 1 nm. The results reported here refer to the reduction of uncertainty in the sub-nanometre range by comparisons of measured periods of one-dimensional sinusoidal gratings using optical diffractometry with expanded uncertainties ≤ 0.1 nm, as well as the SFM with an uncertainty originally estimated to be 1 nm. The goal is to reduce the uncertainty of the measurement results of the SFM, e.g. the thickness of films or the pitch of gratings as far as possible. The present state of work allows to estimate an expanded uncertainty smaller than 0.4 nm. It is hoped to reach a value near the picometre range. The practical goal is to apply this microscopy to evaluations (calibrations) of dimensional parameters of objects in the semiconductor technology and other dimensional micro- and nanostructures. |
