| Zugriffsnummer | 14838 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Investigation of pitch standards for nanometrology in an metrological SEM |
| Autor(in); Institution |
Häßler-Grohne, Wolfgang; 5.22, Längenteilung und Maskenmesssysteme, PTB-Braunschweig
Frase, Carl Georg; 5.22, Längenteilung und Maskenmesssysteme, PTB-Braunschweig
Bosse, Harald; 5.22, Längenteilung und Maskenmesssysteme, PTB-Braunschweig
|
| Quelle/Jahr | Proceedings of the 3rd International Conference [and 4th General Meeting of the] European Society for Precision Engineering and Nanotechnology. Vol. 2:(2002), 617 - 620 |
| Herausgeber(in) |
Delbressine, F. L. M.
|
| ISBN | 90-386-2883-8 |
| Verlag | Eindhoven: Universiteitsdr. TU Eindhoven |
| Konferenzangaben | Euspen, Eindhoven, 26-30, May, 2002, The Netherlands |
| Zusammenfassung | We report on investigations of the capability of a special metrological scanning electron microscope (SEM) to be applied for high precision pitch calibrations of standards used in nanometrology. The application of this type of instrument for calibration of pitch standards shows the advantage to combine a larger travel range with a high resolution e-beam probe of less than 10 nm. Correlation methods are used to determine global pitch values as well as pitch variations. We will discuss procedures and achieved results on 2D Si-pitch standards with gratins periods of 100 nm and 300 nm. Obtained uncertainties for global pitch are less than 60 pm. |
