| Zugriffsnummer | 14793 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region |
| Autor(in); Institution |
Tümmler, Johannes; 7.12, Röntgenradiometrie, PTB-Berlin
Scholze, Frank; 7.12, Röntgenradiometrie, PTB-Berlin
Brandt, Guido; 7.12, Röntgenradiometrie, PTB-Berlin
Meyer, Bernd; 7.12, Röntgenradiometrie, PTB-Berlin
Scholz, Frank; 7.12, Röntgenradiometrie, PTB-Berlin
Vogel, Katrin; 7.12, Röntgenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Poier, Michael; ACCEL Instruments GmbH, Bergisch-Gladbach, GERMANY
Klein, Udo; ACCEL Instruments GmbH, Bergisch-Gladbach, GERMANY
Diete, Wolfgang; ACCEL Instruments GmbH, Bergisch-Gladbach, GERMANY
|
| Quelle/Jahr | Emerging lithographic technologies VI:(2002), 338 - 346 |
| Schriftenreihe | Proceedings of SPIE: 4688,1 |
| Availability | [CD-ROM] ; file name: 4688_39.pdf |
| Herausgeber(in) |
Engelstad, Roxann L.
|
| ISBN | 0-8194-4434-0 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Emerging Lithographic Technologies VI, Santa Clara, 05-07, March, 2002, USA |
| Freie Schlagworte | Extreme ultraviolet ; metrology ; lithography ; at-wavelength characterization ; reflectometry ; synchrotron radiation |
| Zusammenfassung | Since 1986, Physikalisch-Technische Bundesanstalt (PTB), Germany's national metrology institute, has been working on the "at-wavelength" characterization of VUV and EUV optical components with synchrotron radiation. Today, PTB operates a laboratory at the electron storage ring BESSY II. Here, at several beamlines, high-accuracy at-wavelength characterization of EUVL componentes is routinely carried out. Reflectometry is performed on a bending magnet beamline at which a relative uncertainty of 25 % is achieved for the spectral reflectance of a mirror in the EUVL spectral region. For the investigation of very large optical components, a new reflectometer will be set up at the soft x-ray radiometry beamline in March 2002. The reflectometer allows the characterization of full size EUVL optical components. Raster scans across the full sample surface can be performed. Convex or concave profiles are allowed. An additional detector movement out of the scattering plane allows the measurement of bi-directional scattering. Similar measurements can be performed by mounting a cooled CCD camera at different fixed positions on the vacuum chamber. The motor step size for all translational and rotational movements will be 1 μm and 0.001°, respectively. We present a detailed description of the new reflectometer for large EUV optics and discuss the uncertainties to be achieved for reflectance measurements. |
Zitierung
Tümmler, J., Scholze, F., Brandt, G., Meyer, B., Scholz, F., Vogel, K., Ulm, G., Poier, M., Klein, U., & Diete, W. (2002). New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region. Emerging Lithographic Technologies VI, Santa Clara, 05-07, March, 2002, USA. https://doi.org/10.1117/12.472307