Zugriffsnummer 13784
Dokumenttyp Zeitschriftenartikel
Sprache Englisch
Titel Nanoscale patterning of self-assembled monolayers with electrons
Autor(in); Institution
Gölzhäuser, Armin; Universität Heidelberg, Angewandte Physikalische Chemie, Heidelberg, GERMANY
Geyer, W.; Universität Heidelberg, Angewandte Physikalische Chemie, Heidelberg, GERMANY
Stadler, V.; Universität Heidelberg, Angewandte Physikalische Chemie, Heidelberg, GERMANY
Eck, W.; Universität Heidelberg, Angewandte Physikalische Chemie, Heidelberg, GERMANY
Grunze, M.; Universität Heidelberg, Angewandte Physikalische Chemie, Heidelberg, GERMANY
Edinger, K.; University of Maryland, Laboratory for Ion Beam Research, USA
Weimann, Thomas; 2.404, Nanostrukturen für technische Anwendungen, PTB-Braunschweig
Hinze, Peter; 2.404, Nanostrukturen für technische Anwendungen, PTB-Braunschweig
Quelle/Jahr Journal of vacuum science and technology B: 18 (2000), 6, 3414 - 3418
ISSN 0734-211X
DOI
Klassifikationscode PACS: 85.40.Ux ; PACS: 85.40.Hp ; PACS: 68.18.+p ; PACS: 81.65.Cf
Freie Schlagworte gold ; nanotechnology ; focused ion beam technology ; electron beam lithography ; proximity effect (lithography) ; etching ; atomic force microscopy ; scanning electron microscopy ; monolayers ; self-assembly ; electron resists ; organic compounds
Zusammenfassung We show the fabrication of gold nanostructures using self-assembled monolayers of aliphatic and aromatiac thiols as positive and negative electron beam resists. We applied a simple and versatile proximity printing technique using focused ion beam structured stencil masks and low energy (300 eV) electrons. We also used conventional e-beam lithography with a beam energy of 2.5 keV and doses from 3500 to 80000 λC/cm2 Gold patterns were generated by wet etching in KCN/KOH and characterized by atomic force microscopy and scanning electron microscopy. The width of the finest lines is ≈ 20 nm; their edge definition is limited by the isotropic etching process in the polycristalline gold.

Zitierung

Gölzhäuser, A., Geyer, W., Stadler, V., Eck, W., Grunze, M., Edinger, K., Weimann, T., & Hinze, P. (2000). Nanoscale patterning of self-assembled monolayers with electrons. Journal of vacuum science and technology B, 18(6), 3414–3418. https://doi.org/10.1116/1.1319711

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