| Zugriffsnummer | 13671 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | First results of TXRF measurements of low Z elements on Si wafer surfaces at the PTB plane grating monochromator beamline for undulator radiation at BESSY II |
| Autor(in); Institution |
Streli, C.; Atominstitut, Wien, AUSTRIA
Wobrauschek, P.; Atominstitut, Wien, AUSTRIA
Beckhoff, Burkhard; 7.12, Röntgenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Fabry, L.; Wacker Siltronic AG, Burghausen, GERMANY
Pahlke, S.; Wacker Siltronic AG, Burghausen, GERMANY
|
| Quelle/Jahr | X-Ray Spectrometry: 30 (2001), 1, 24 - 31 |
| ISSN | 0049-8246 |
| DOI | |
| Verlag | Chichester [u.a.]: Wiley |
| Zusammenfassung | First measurements of low Z elements on Si wafer surfaces with undulator and wiggler radiation excited Total Reflection X-ray Fluorescence Analysis (TXRF) have been performed at the PTB plane grating monochromator beamline for undulator radiation at the electron storage ring BESSY II. The SR-TXRF spectrometer for low Z elements of the Atominstitut was used, equipped with a down-looking GeHP detector with a 300 nm NORWAR window, with the wafer positioned horizontally. Experiments have been performed with excitation energies above 0.7 keV in wiggler mode as well as with excitation energies below 0.7 keV in undulator mode of the PTB insertion device U180. For droplet samples on Si wafer surfaces detection limits for Na down to C were found to be in the low pg range. |
Zitierung
Streli, C., Wobrauschek, P., Beckhoff, B., Ulm, G., Fabry, L., & Pahlke, S. (2001). First results of TXRF measurements of low Z elements on Si wafer surfaces at the PTB plane grating monochromator beamline for undulator radiation at BESSY II. X-Ray Spectrometry, 30(1), 24–31. https://doi.org/10.1002/xrs.463