| Zugriffsnummer | 12985 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Multilayer reflectance during exposure to EUV radiation |
| Autor(in); Institution |
Oestreich, Sebastian; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Klein, Roman; 7.12, Röntgenradiometrie, PTB-Berlin
Scholze, Frank; 7.12, Röntgenradiometrie, PTB-Berlin
Jonkers, Jeroen; Philips Research, Eindhoven, Nieuwegein, THE NETHERLANDS
Louis, Eric; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Yakshin, Andrey; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Görts, Peter; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Haidl, Markus; Carl Zeiss, Oberkochen, GERMANY
Bijkerk, Fred; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
|
| Quelle/Jahr | Soft X-Ray and EUV Imaging Systems:(2000), 64 - 71 |
| Schriftenreihe | Proceedings of SPIE: 4146 |
| Herausgeber(in) |
Kaiser, Winfried M.
Stulen, Richard H.
|
| ISSN | 0277-786X |
| ISBN | 0-8194-3791-3 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Soft X-Ray and EUV Imaging Systems, San Diego, 30, July - 4, August, 2000, USA |
| Freie Schlagworte | Extreme ultraviolet lithography ; EUV optics ; surface contamination ; multilayer mirrors ; hydrocarbon contamination ; ozone cleaning |
| Zusammenfassung | Mo/Si multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm2 were applied at the PTB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3x10-8 mbar (without hydrocarbons) and 10-7 mbar (with hydrocarbons) at EUV intensities of 3 mW/mm2 , respectively 0.2 mdW/mm2 have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using V produced ozone from air at atmospheric pressure, were performed and show that Mo/Si mirrors do not suffer from prologed exposure to ozone. |
Zitierung
Oestreich, S., Klein, R., Scholze, F., Jonkers, J., Louis, E., Yakshin, A., Görts, P., Ulm, G., Haidl, M., & Bijkerk, F. (2000). Multilayer reflectance during exposure to EUV radiation. Soft X-Ray and EUV Imaging Systems, San Diego, 30, July - 4, August, 2000, USA. https://doi.org/10.1117/12.406677