| Zugriffsnummer | 12970 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Progress in Mo/Si multilayer coating technology for EUVL optics |
| Autor(in); Institution |
Louis, E.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Yakshin, A. E.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Görts, P. C.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Oestreich, S.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Stuik, R.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Maas, E. L. G.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Kessels, M. J. H.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Bijkerk, F.; FOM Institute for Plasma Physics Rijnhuizen, THE NETHERLANDS
Haidl, M.; Carl Zeiss, Oberkochen, GERMANY
Schmitz, Detlef; 7.12, Röntgenradiometrie, PTB-Berlin
Scholze, Frank; 7.12, Röntgenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
|
| Quelle/Jahr | Emerging lithographic technologies IV:(2000), 406 - 411 |
| Schriftenreihe | Proceedings of SPIE: 3997 |
| Herausgeber(in) |
Dobisz, Elizabeth A.
|
| ISSN | 0277-786X |
| ISBN | 0-8194-3615-1 |
| DOI | |
| Verlag | Washington: SPIE |
| Konferenzangaben | Microlithography, Santa Clara, 28 February - 1 March 2000, USA |
| Freie Schlagworte | Mo/Si multilayer coatings ; normal-incidence reflectivity ; electron-beam deposition ; EUVL |
| Zusammenfassung | Extensive optimization on the fabrication of Mo/Si multilayer systems is carried out at the FOM Institute Rijnhuizen using e-beam evaporation. The process is being optimized including parameters such as variation of the mirror's centre wavelength, the metal fraction, deposition parameters, and the layer composition. Reflectivities of 69.5 % are demonstrated at normal incidence, with values of 67 to 69% being routinely achieved, demonstrating the capabilities of the deposition process. Some evidence of smoothening to interface roughness values lower than the roughness of the initial substrate is given. Furthermore, investigation of the temporal behaviour of the coatings does not indivate any loss of reflectivity over an eight-month period. An analysis of the multilayer composition and the interface roughness is given. The reflectivity measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin. The results of measurements at both facilities are found to be indentical and accuracy is discussed in detail. |
Zitierung
Louis, E., Yakshin, A. E., Görts, P. C., Oestreich, S., Stuik, R., Maas, E. L. G., Kessels, M. J. H., Bijkerk, F., Haidl, M., Schmitz, D., Scholze, F., & Ulm, G. (2000). Progress in Mo/Si multilayer coating technology for EUVL optics. Microlithography, Santa Clara, 28 February - 1 March 2000, USA. https://doi.org/10.1117/12.390077