Zugriffsnummer 12852
Dokumenttyp Zeitschriftenartikel
Sprache Englisch
Titel A very low-noise single-electron electrometer of stacked-junction geometry
Autor(in); Institution
Krupenin, V. A.; Laboratory of Cryoelectronics, Moscow State University, RUSSIAN FEDERATION
Presnov, D. E.; Laboratory of Cryoelectronics, Moscow State University, RUSSIAN FEDERATION
Zorin, Alexander B.; 2.42, Metallische Strukturen, PTB-Braunschweig
Niemeyer, Jürgen; 2.4, Quantenelektronik, PTB-Braunschweig
Quelle/Jahr Physica B: 284-288 (2000), 1800 - 1801
ISSN 0921-4526
DOI
Freie Schlagworte single electron tunneling ; charge noise
Zusammenfassung An Al single-electron electrometer of stacked design was studied. The manufacturing technique chosen ensured that there was no direct contact between the transistor island and dielectric substrate. The noise figure of the transistor was found to be exceptionally low: Qx = (8 ± 2)·10-6 e/Hz1/2 at 10 Hz.

Zitierung

Krupenin, V. A., Presnov, D. E., Zorin, A. B., & Niemeyer, J. (2000). A very low-noise single-electron electrometer of stacked-junction geometry. Physica B, 284-288, 1800–1801. https://doi.org/10.1016/s0921-4526(99)02990-7

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