| Zugriffsnummer | 12733 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Angstrom ruler for high-accuracy pitch measurement |
| Autor(in); Institution |
Lin, Wang; University of Wisconsin-Madison, Department of Material Science and Engineering, Madison, USA
Dacheng, Li; Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Beijing, CHINA
Mang, Cao; Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Beijing, CHINA
Koenders, Ludger; 5.12, Mikro- und Nanotopographie, PTB-Braunschweig
Kuetgens, Ulrich; Q.201, Avogadro, PTB-Braunschweig
Becker, Peter; Q.201, Avogadro, PTB-Braunschweig
|
| Quelle/Jahr | Applied Optics: 39 (2000), 25, 4535 - 4539 |
| ISSN | 0003-6935 (PRINT) |
| Verlag | Washington, DC: OSA |
| Klassifikationscode | OCIS: 340.7450 ; OCIS: 120.3940 ; OCIS: 120.3180 ; OCIS: 120.4120 ; OCIS: 120.4640 |
| Zusammenfassung | An x-ray interferometer (XRI), which takes the lattice spacing of silicon as a length unit, can measure displacement with subnanometer resolution. A scanning probe microscope that combines an XRI and a scanning-tunnel microscope is designed to measure pitch. Experimental results have proved the feasibility of the design. |
