| Zugriffsnummer | 12450 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Edge roughness of chromium structures on photomasks |
| Autor(in); Institution |
Häßler-Grohne, Wolfgang; 5.11, Maskenmesstechnik, PTB-Braunschweig
|
| Quelle/Jahr | Proceedings of the 4th Seminar on Quantitative Microscopy QM 2000 : dimensional measurements in the micro- and nanometre range, applications, challenges, state-of-the-art:(2000), 75 - 80 |
| Schriftenreihe | PTB-Bericht PTB-F-39 |
| Herausgeber(in) |
Hasche, Klaus; 5, Fertigungsmesstechnik, PTB-Braunschweig
Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig
Wilkening, Günter; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
|
| ISSN | 0179-0609 |
| ISBN | 3-89701-503-X |
| Berichtsnummer | PTB-F-39 |
| Verlag | Braunschweig: Physikalisch-Technische Bundesanstalt |
| Konferenzangaben | 4th Seminar on Quantitative Microscopy : QM 2000, Semmering, 12-14, Januar, 2000, Austria |
| Freie Schlagworte | Edge roughness ; chromium structures |
| Zusammenfassung | The line edge quality of microstructures is increasingly important for semiconductor production due to the continuing decrease of structure widths. Moreover, because of the introduction of resolution enhancement techniques in lithography the fidelity of details of chromium structures on photomasks is of special interest. In this contribution, the application of scanning slit reflection light microscopy for line edge roughness characterization is described. The measurement principle, necessary corrections and achievable measurement uncertainty is explained. SEM line edge roughness characterization and optical results showed agreement within 10 nm. |
