| Zugriffsnummer | 12263 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Calibration of standards for precision pitch measurement in the nanometre region by combined scanning tunneling microscopy and x-ray interferometry |
| Autor(in); Institution |
Wang, Lin; Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Beijing, CHINA
Kuetgens, Ulrich; Q.201, Avogadro, PTB-Braunschweig
Becker, Peter; Q.201, Avogadro, PTB-Braunschweig
Koenders, Ludger; 5.12, Mikrotopographie, PTB-Braunschweig
Li, Dacheng; Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Beijing, CHINA
Mang, Cao; Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Beijing, CHINA
|
| Quelle/Jahr | Nanotechnology: 10 (1999), 412 - 417 |
| ISSN | 0957-4484 |
| DOI | |
| Verlag | Bristol: IOP |
| Freie Schlagworte | Subnanometer measurement ; transfer standards for STM ; x-ray interferometry |
| Zusammenfassung | The successful combined operation of a scanning tunnelling microscope (STM), as a representative of scanning probe microscopes (SPMs), with an x-ray interferometer (XRI) has been demonstrated. XRIs can calibrate nanometric displacement transducers and related instruments using silicon lattice parameters as secondary length standards. On the other hand SPMs could calibrate standards e.g. diffraction gratings for dimensional metrology. The wide measuring ranges of these instruments reach from the diameters of atoms to dimensions of 100 μm. Some special "metrology SPMs" are calibrated against a laser interferometer and are affected by their non-linearity of 1-2 nm. This uncertainty limits the SPM and the sample calibration. Further improvement is necessary. If the sample displacement under an SPM is measured with the resolution of an XRI, it should be possible to calibrate transfer standards with sub-nanometer accuracy. Here we report, for the first time, pitch measurements for a structure on a sample, not of ideal shape but available for this experiment. The translation of the sample and the measurement of its profil were performed by a specially developed scanning XRI which uses the almost homogeneous silicon lattice spacing (Δd/d<10-7) as a secondary length standard ("Angstrom Ruler") for subnanometer measurements. |
| Rechteinformation | 1999, IOP Publishing Ltd. |
Zitierung
Wang, L., Kuetgens, U., Becker, P., Koenders, L., Li, D., & Mang, C. (1999). Calibration of standards for precision pitch measurement in the nanometre region by combined scanning tunneling microscopy and x-ray interferometry. Nanotechnology, 10, 412–417. https://doi.org/10.1088/0957-4484/10/4/309