| Zugriffsnummer | 11782 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Comparison of linewidth measurements on Si structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM) |
| Autor(in); Institution |
Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig
Frase, Carl Georg; 5.11, Maskenmesstechnik, PTB-Braunschweig
|
| Quelle/Jahr | Proceedings of the 3rd Seminar on Quantitative Microscopy : geometrical measurements in the micro- and nanometre range with far and near field methods:(1998), 89 - 96 |
| Schriftenreihe | PTB-Bericht PTB-F-34 |
| Herausgeber(in) |
Hasche, Klaus; 5, Fertigungsmesstechnik, PTB-Braunschweig
Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig
Wilkening, Günter; 5.1, Mikrometrologie, PTB-Braunschweig
|
| ISSN | 0179-0609 |
| ISBN | 3-89701-280-4 |
| Berichtsnummer | PTB-F-34 |
| Verlag | Bremerhaven: Wirtschaftsverl. NW |
| Konferenzangaben | 3rd Seminar on Quantitative Microscopy, Geometrical measurements in the micro- and nanometre range with far and near fields methods, Lyngby, 05-06, November, 1998, Denmark |
| Zusammenfassung | Measurements of the top widths of anisotropically etched Si lines have been performed by means of PTB's SEM based metrological system (EOMS) and a special AFM system (VERITECT3). Good agreement of the measurements resulted from the evaluation of the SEM images by suitable theoretical models based on Monte Carlo Simulation and by using adequate methods for characterising the probe tips in atomic force microscopy. |
| Rechteinformation | 1998, Physikalisch-Technische Bundesanstalt |
Zitierung
Mirandé, W. & Frase, C. G. (1998). Comparison of linewidth measurements on Si structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM). 3rd Seminar on Quantitative Microscopy, Geometrical measurements in the micro- and nanometre range with far and near fields methods, Lyngby, 05-06, November, 1998, Denmark.