| Zugriffsnummer | 11686 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Investigations on focused ion beam treated near-field probes based on silicon |
| Autor(in); Institution |
Danzebrink, Hans-Ulrich; 5.12, Mikrotopographie, PTB-Braunschweig
Dziomba, Thorsten; 5.12, Mikrotopographie, PTB-Braunschweig
Sulzbach, Thomas; Nanosensors Dr. Olaf Wolter GmbH, Aidlingen, GERMANY
Ohlsson, Olaf; Nanosensors Dr. Olaf Wolter GmbH, Aidlingen, GERMANY
Lehrer, Christoph; Fraunhofer Institut (IIS-B), Erlangen, GERMANY
Frey, Lothar; Fraunhofer Institut (IIS-B), Erlangen, GERMANY
|
| Quelle/Jahr | Technical digest of the 5th International Conference on Near Field Optics and Related Techniques:(1998), 408 - 409 |
| Herausgeber(in) |
Kawata, S.
|
| Verlag | s.l.: |
| Konferenzangaben | 5th International Conference on Near Field Optics (NFO-5), Shirahama, 06-10, December, 1998, Japan |
| Freie Schlagworte | scanning near-field optical microscopy (SNOM) ; atomic force microscopy (AFM) ; focused ion beam technique (FIB) ; internal reflection mode ; cross-polarized detection |
| Zusammenfassung | The near-field probes described here are based on metallized non-contact AFM-cantilevers made of silicon. For the application in high-resolution near-field optical/infrared microscopy, we use aperture probes with the aperture fabricated by focused ion beams (FIB). This technique allows us to create apertures with different geometries of subwavelength dimensions. Here we present the use of slit-shaped apertures which show a polarization-dependent transmission efficiency and a lateral resolution below 100 nm at a wavelength of 1064 nm. As test sample for the characterization of the near-field probes we investigated gold/palladium structures, deposited on an ultrathin chromium sublayer on a silicon wafer, in constant-height mode. |
Zitierung
Danzebrink, H.-U., Dziomba, T., Sulzbach, T., Ohlsson, O., Lehrer, C., & Frey, L. (1998). Investigations on focused ion beam treated near-field probes based on silicon. 5th International Conference on Near Field Optics (NFO-5), Shirahama, 06-10, December, 1998, Japan.