| Zugriffsnummer | 11240 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Analysis and comparison of CD-SEM edge operators: a contribution to feature width metrology |
| Autor(in); Institution |
Frase, Carl Georg; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Häßler-Grohne, Wolfgang; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Buhr, Egbert; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Hahm, Kai; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Bosse, Harald; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
|
| Quelle/Jahr | Nanoscale calibration standards and methods : dimensional and related measurements in the micro- and nanometre range:(2005), 385 - 403 |
| Herausgeber(in) |
Wilkening, Günter; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
Koenders, Ludger; 5.1, Nano- und Mikrometrologie, PTB-Braunschweig
|
| ISBN | 3-527-40502-X ; 978-3-527-40502-2 |
| Verlag | Weinheim: Wiley-VCH |
| Konferenzangaben | NanoScale 2004, Seminar on Quantitative Microscopy and Nanoscale Calibration Standards and Methods, Braunschweig, 25-26, March, 2004, Germany |
| Zusammenfassung | We report on feature width or critical dimension (CD) measurements by means of scanning electron microscopes (CD-SEM). For CD evaluation, CD-SEM edge operators are used to deduce critical dimension of structures in the sub-micrometer region from SEM measurements. Three algorithms are presented and discussed that extract information about microstructures, especially chromium structures on chromium-on-quartz photomasks, from SEM images, respectively secondary electron intensity profiles. An exponential fit operator (peak flank fit) is used in two variations to determine the top edge position of a feature, a Gaussian peak fit operator is applied for line edge roughness (LER) measurements. Furthermore, a signal decay operator is presented that is used to estimate the degree of charging of the quartz substrate. A Monte Carlo model of SEM image formation is applied to investigate the effect of parameter variation, both specimen and measurement tool parameters, on signal formation and CD evaluation. It will be shown that for the low voltage SEM instrumentation used in our group the application of the exponential rise operator allows to determine the top edge position of a feature from measured SEM images with achievable uncertainties of about U = 15 nm (k=2). |
Zitierung
Frase, C. G., Häßler-Grohne, W., Buhr, E., Hahm, K., & Bosse, H. (2005). Analysis and comparison of CD-SEM edge operators: a contribution to feature width metrology. NanoScale 2004, Seminar on Quantitative Microscopy and Nanoscale Calibration Standards and Methods, Braunschweig, 25-26, March, 2004, Germany.