| Zugriffsnummer | 10489 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | High-accuracy VUV reflectometry at selectable sample temperatures [poster] |
| Autor(in); Institution |
Gottwald, Alexander; 7.1, Photonenradiometrie, PTB-Berlin
Kroth, Udo; 7.1, Photonenradiometrie, PTB-Berlin
Schoeppe, Hendrik; 7.1, Photonenradiometrie, PTB-Berlin
Richter, Mathias; 7.1, Photonenradiometrie, PTB-Berlin
Letz, M.; Schott Glas, Mainz, GERMANY
|
| Quelle/Jahr | Optical constants of materials for UV to X-ray wavelengths:(2004), 157 - 164 |
| Schriftenreihe | Proceedings of SPIE: 5538 |
| ISSN | 0277-786X |
| ISBN | 0-8194-5476-1 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE 49th Annual Meeting, Denver, Colorado, July 31- August 7, 2004, USA |
| Freie Schlagworte | reflectometry ; optical constants ; vacuum-ultraviolet radiation |
| Zusammenfassung | Characterization of optical materials and components is one of the major tasks of the Radiometry Laboratory of the Physikalisch-Technische Bundesanstalt, Germany's national metrology institute, at the synchrotron radiation source BESSY II. Using spectrally dispersed synchrotron radiation, reflectometry measurements have been performed on highly pure CaF2 crystals in the VUV spectral region between 90 nm and 130 nm wavelength in the vicinity of the absorption edge. Here, the optical constants are influenced by an excitonic resonance directly correlated to the recently found anisotropy of the crystal at 157-nm wavelength. To investigate temperature-dependent effects, the reflectometer sample holder has been equipped with a heater/cooler stage, which currently enables measurements at stable temperatures in the range between -50° C and +80° C. |
