| Zugriffsnummer | 10469 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Spatial and spectral characterization of a laser produced plasma source for EUV metrology |
| Autor(in); Institution |
Legall, H.; Max-Born-Institut, Berlin, GERMANY
Stiel, H.; Max-Born-Institut, Berlin, GERMANY
Vogt, U.; Max-Born-Institut, Berlin, GERMANY
Schönnagel, H.; Max-Born-Institut, Berlin, GERMANY
Nickles, P.-V.; Max-Born-Institut, Berlin, GERMANY
Tümmler, Johannes; 7.1, Photonenradiometrie, PTB-Berlin
Scholz, Frank; 7.1, Photonenradiometrie, PTB-Berlin
Scholze, Frank; 7.1, Photonenradiometrie, PTB-Berlin
|
| Quelle/Jahr | Review of Scientific Instruments: 75 (2004), 11, 4981 - 4988 |
| ISSN | 0034-6748 |
| DOI | |
| Verlag | Melville, NY: AIP |
| Freie Schlagworte | extreme UV ; laser-produced plasma source ; radiometry |
| Zusammenfassung | We present a laser produced plasma (LPP)-source optimized for metrology and the results of its radiometric characterization. The presented (LPP)-source can be used for reflectometry and spectroscopy in the soft x-ray range. For these applications stable operation with high spectral photon yields, high reliability in continuous operation and, to reach high spectral resolution, a small source size and high source point stability is necessary. For the characterization of the source, special instruments have been designed and calibrated using the soft X-ray radiometry beamline of the Physikalisch-Technische-Bundesanstalt (PTB) at BESSY. These instruments are an imaging spectrometer, a double multilayer tool for in-band power measurements, a transmission slit grating spectrograph and a pinhole camera. From the measurements a source size of 30 μm by 55 μm (2 σ, horizontal by vertical) and a stability of better than 5 μm, horizontally and 9 μm vertically were obtained. The source provides a flat continuous emission in the extreme ultraviolet (EUV) range around 13.4 nm and a spectral photon flux of up to 1*1014 /(s sr 0.1 nm) at a pump laser pulse energy of 650 mJ. The shot-to-shot stability of the source is about 5% (1 σ) for laser pulse energies above 200 mJ. It is shown that an Au-LPP source provides spectrally reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer and for XUV spectroscopy. |
Zitierung
Legall, H., Stiel, H., Vogt, U., Schönnagel, H., Nickles, P.-V., Tümmler, J., Scholz, F., & Scholze, F. (2004). Spatial and spectral characterization of a laser produced plasma source for EUV metrology. Review of Scientific Instruments, 75(11), 4981–4988. https://doi.org/10.1063/1.1807567