| Zugriffsnummer | 10375 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Development and characterization of new CD mask standard: a status report |
| Autor(in); Institution |
Schätz, Thomas; Infineon Technologies, München, GERMANY
Hauffe, Bertam; Photronics MZD GmbH & Co. KG, Dresden, GERMANY
Döbereiner, Stefan; Mue Tec Gmbh, München, GERMANY
Brück, Hans-Jürgen; Mue Tec Gmbh, München, GERMANY
Brendel, Bernd; Leica Microsystems Lithography GmbH, Jena, GERMANY
Bettin, Lutz; Leica Microsystems Lithography GmbH, Jena, GERMANY
Röth, Klaus-Dieter; Leica Microsystems Lithography GmbH, Wetzlar, GERMANY
Steinberg, Walter; Leica Microsystems Lithography GmbH, Wetzlar, GERMANY
Speckbacher, Peter; Dr. Johannes Heidenhain GmbH, Traunreut, GERMANY
Sedlmeier, Wolfgang; Dr. Johannes Heidenhain GmbH, Traunreut, GERMANY
Engel, Thomas; Carl Zeiss Microelectronic Systems GmbH, Jena, GERMANY
Häßler-Grohne, Wolfgang; 5.22, Längenteilung und Maskenmesssysteme, PTB-Braunschweig
Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig
Bosse, Harald; 5.2, Längen- und Winkelmesstechnik, PTB-Braunschweig
|
| Quelle/Jahr | EMC 2003 : 19th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components:(2003), 37 - 45 |
| Schriftenreihe | GMM-Fachbericht: 39 |
| Herausgeber(in) |
Behringer, Uwe
|
| ISSN | 1432-3419 |
| ISBN | 3-8007-2748-X |
| Verlag | Berlin [u.a.]: VDE-Verlag |
| Konferenzangaben | GMM-Conference, Sonthofen, 13-15, January, 2003, Germany |
| Zusammenfassung | We report on the current status of a project on development and characterization of CD photomasks with 6025 format to be used as reference standards for different type of CD metrology instruments. The project consortium consists of mask suppliers, manufacturers of CD metrology instruments, users of such instruments and calibration laboratories. Different type of CD metrology instrumentation, namely optical CD microscopes, CD-SEM, and AFM will be applied for investigation and measurement of microstructures, additionally supported by AIMS tool. We will describe the basic design criteria of the mask standard and first measurement results gained with different metrology tools on the prototype mask standards. |
Zitierung
Schätz, T., Hauffe, B., Döbereiner, S., Brück, H.-J., Brendel, B., Bettin, L., Röth, K.-D., Steinberg, W., Speckbacher, P., Sedlmeier, W., Engel, T., Häßler-Grohne, W., Mirandé, W., & Bosse, H. (2003). Development and characterization of new CD mask standard: a status report. GMM-Conference, Sonthofen, 13-15, January, 2003, Germany.