| Zugriffsnummer | 10109 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | New laboratory EUV reflectometer for large optics using a laser plasma source |
| Autor(in); Institution |
Loyen, Ludwig van; Fraunhofer Institute Material and Beam Technology, IWS Dresden, GERMANY
Böttger, Thomas; Fraunhofer Institute Material and Beam Technology, IWS Dresden, GERMANY
Braun, Stefan; Fraunhofer Institute Material and Beam Technology, IWS Dresden, GERMANY
Mai, Herrmann; Fraunhofer Institute Material and Beam Technology, IWS Dresden, GERMANY
Leson, Andreas; Fraunhofer Institute Material and Beam Technology, IWS Dresden, GERMANY
Scholze, Frank; 7.12, Röntgenradiometrie, PTB-Berlin
Tümmler, Johannes; 7.12, Röntgenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Legall, Herbert; Max-Born-Institut, Berlin, GERMANY
Nickles, Peter V.; Max-Born-Institut, Berlin, GERMANY
Sandner, Wolfgang; Max-Born-Institut, Berlin, GERMANY
Stiel, Holger; Max-Born-Institut, Berlin, GERMANY
Rempel, Christian E.; Bestec GmbH, Berlin, GERMANY
Schulze, Mirko; AIS Automation Dresden GmbH, Dresden, GERMANY
Brutscher, Jörg; GBS-Elektronik GmbH, Großerkmannsdorf, GERMANY
Macco, Fritz; Carl Zeiss SMT AG, GERMANY
Müllender, Stefan; Carl Zeiss SMT AG, GERMANY
|
| Quelle/Jahr | Metrology, inspection, and process control for microlithography XVII:(2003), 12 - 21 |
| Schriftenreihe | Proceedings of SPIE: 5038,1 |
| Herausgeber(in) |
Herr, Daniel J. C.
|
| ISBN | 0-8194-4843-5 |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Conference on Metrology, Inspection, and Process Control for Microlithography XVII ; SPIE's 28th Annual International Symposium and Education Program on Microlithography, Santa Clara, California, 23-28, February, 2003, USA, Santa Clara, Calif., 23-28, February, 2003, USA |
Zitierung
Loyen, L. V., Böttger, T., Braun, S., Mai, H., Leson, A., Scholze, F., Tümmler, J., Ulm, G., Legall, H., Nickles, P. V., Sandner, W., Stiel, H., Rempel, C. E., Schulze, M., Brutscher, J., Macco, F., & Müllender, S. (2003). New laboratory EUV reflectometer for large optics using a laser plasma source. Conference on Metrology, Inspection, and Process Control for Microlithography XVII ; SPIE's 28th Annual International Symposium and Education Program on Microlithography, Santa Clara, California, 23-28, February, 2003, USA, Santa Clara, Calif., 23-28, February, 2003, USA.