| Zugriffsnummer | 10030 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Sub-nm topography measurement by deflectometry: Flatness standard and wafer nanotopography |
| Autor(in); Institution |
Geckeler, Ralf D.; 4.21, Bildoptik und Spektrometrie, PTB-Braunschweig
Weingärtner, Ingolf; 4.21, Bildoptik und Spektrometrie, PTB-Braunschweig
|
| Quelle/Jahr | Advanced characterization techniques for optical, semiconductor, and data storage components:(2002), 1 - 12 |
| Schriftenreihe | Proceedings of SPIE: 4779 |
| Herausgeber(in) |
Duparré, Angela
|
| ISBN | 0-8194-4546-0 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Advanced characterization techniques for optical, semiconductor, and data storage component, Seattle, 9-11, July, 2002, USA |
| Freie Schlagworte | scanning deflectometry ; flatness standard ; traceability ; topography ; autocollimator ; dimensional metrology |
Zitierung
Geckeler, R. D. & Weingärtner, I. (2002). Sub-nm topography measurement by deflectometry: Flatness standard and wafer nanotopography. Advanced characterization techniques for optical, semiconductor, and data storage component, Seattle, 9-11, July, 2002, USA. https://doi.org/10.1117/12.451723